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| Chromium Sputtering Target  | | Purity: Ranging from 99.5%(2N5) - 99.995%(4N5)Powder:50,100&325 mesh
Advance Powder Metallurgy: Hot Isostatic Process
Density:7.19gm/cm3 based on 99.9% purity
Physical Properties: Isotropic properties,... | [Country: Singapore]
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